![](/_gatsby/image/5fc75b91cb0176014230296428ce8897/008158768e0040463898135da34bc4a3/IMG_0102.jpg?u=https%3A%2F%2Fimages.ctfassets.net%2F9uejui175jzg%2F3Zez13l1L6slV1hRpaFur%2Fc8c102fbd2f12e69d390cc4fbe220470%2FIMG_0102.JPG&a=w%3D750%26h%3D500%26fm%3Djpg%26q%3D75&cd=2023-09-01T02%3A16%3A57.793Z)
Bulk Transmission Geometry
– 1 minute to read
Description
Specifications
- Suitable for higher energy x-ray sources commonly available at synchrotron facilities or in Ag or Mo laboratory systems.
- Mechanical strain and electrical polarisation measurements in situ.
- Applied voltages ±7.5 kV,
- The recommended amplifier is the Trek 10/10B-HS, although custom cabling for alternative amplifiers can be provided upon request.
- Silicon oil bath for achieving high fields.
- Sample dimensions of up to 4 x 4 x 10 mm . Optimal sample sizes depend on x-ray beam energy and geometry. Silicon bath options for ceramic or single crystal measurements.
- Temperature range from room temperature to 200°C.
- Large scattering angle range in two tilt directions, allowing for advanced techniques such as,
- High-q scattering for Pair Distribution Function analysis of materials.
- Large volume reciprocal space mapping on single crystals.
- Compact system design for maximum portability and versatility.
- Interlock system for voltage application only when cell is closed.
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Image Gallery
Demonstration
Related Products
![Product Bulk Reflection Geometry](/_gatsby/image/3717847a28876861fde13116c6ce9588/f827427280341b20da9eb0ab4d3eed46/RigakuSmartlabRCell.png?u=https%3A%2F%2Fimages.ctfassets.net%2F9uejui175jzg%2F7FqS5ouN8KrFMml82OCeEH%2F8e634c25313f5011e734b055a194b5c4%2FRigakuSmartlabRCell.png&a=w%3D750%26h%3D375%26fm%3Dpng%26q%3D75&cd=2022-08-24T07%3A18%3A54.611Z)
The Reflection Geometry system allows electric fields of ±5kV to be applied to bulk materials while conducting XRD measurements from a surface. Ideal for electro-ceramic and single crystal research in laboratory or synchrotron x-ray systems. Electrical current and displacements sensors are packaged within the unit allowing simultaneous strain and polarization measurements.
![Product Thin Film](/_gatsby/image/832c69c1fa25bab7fdc78c8d52058b14/f827427280341b20da9eb0ab4d3eed46/BrukerD8SmallSnapshotTFCell.png?u=https%3A%2F%2Fimages.ctfassets.net%2F9uejui175jzg%2F2CUY8qdZ3fJZRZpeybJlu5%2Fac0de9df607a9b599c19c03ee400e493%2FBrukerD8SmallSnapshotTFCell.png&a=w%3D750%26h%3D375%26fm%3Dpng%26q%3D75&cd=2022-08-25T02%3A46%3A12.206Z)
The Thin Film measurement system packages an entire probe station into a compact head unit for use within existing XRD equipment. While conducting structural XRD measurements, static or cyclic fields between ±50V can be applied. Current, polarization, I-V and C-V curve measurements can be obtained simultaneously.